PLASMA TREATMENT APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

A plasma treatment apparatus includes a discharge device generating plasma under atmospheric pressure, and a nonmetallic tube capable of advancing the plasma generated in the discharge device. The discharge device includes a discharge body with an internal space, and the plasma being generated in th...

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Bibliographische Detailangaben
Hauptverfasser: ITO, Fuyuma, AKEBOSHI, Yuya, YOSHIMIZU, Yasuhito, YASUI, Hiroyuki
Format: Patent
Sprache:eng
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Zusammenfassung:A plasma treatment apparatus includes a discharge device generating plasma under atmospheric pressure, and a nonmetallic tube capable of advancing the plasma generated in the discharge device. The discharge device includes a discharge body with an internal space, and the plasma being generated in the internal space. The nonmetallic tube is connected to the discharge body, and includes a material different from a material of the discharge body. The plasma is released from the nonmetallic tube to an environment under atmospheric pressure.