SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:wherein R1, R2 and R3 each represent I or F, R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, a haloalkyl group or a hydrocarbon group, X1, X2 and X3 each represent O or S, m1 and m7...

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Bibliographische Detailangaben
Hauptverfasser:	ICHIKAWA, Koji, KOMURO, Katsuhiro
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Disclosed are a salt represented by formula (I), an acid generator and a resist composition:wherein R1, R2 and R3 each represent I or F, R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, a haloalkyl group or a hydrocarbon group, X1, X2 and X3 each represent O or S, m1 and m7 represent an integer of 0 to 5, m2, m3, m4, m5, m6, m8 and m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, at least one of m1, m2, m3 represents an integer of 1 or more, X4 represents a single bond, -CH2-, -O-, -S-, -CO-, -SO- or -SO2-, and AI− represents an organic anion.