POLISHING LIQUID COMPOSITION FOR SILICON OXIDE FILM

Provided is a polishing liquid composition that is able to improve the polishing rate of a silicon oxide film in one aspect.An aspect of the present disclosure relates to a polishing liquid composition for a silicon oxide film. The polishing liquid composition contains cerium oxide particles (compon...

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Bibliographische Detailangaben
Hauptverfasser:	SEIKE, Takanao, DOI, Haruhiko, SUGAHARA, Masato, YAMAGUCHI, Norihito, INOUE, Masaki
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES
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Beschreibung
Zusammenfassung:	Provided is a polishing liquid composition that is able to improve the polishing rate of a silicon oxide film in one aspect.An aspect of the present disclosure relates to a polishing liquid composition for a silicon oxide film. The polishing liquid composition contains cerium oxide particles (component A), an additive (component B), and an aqueous medium. The component B is a compound having a reduction potential of (145 V or more when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry (with an Ag/AgCl electrode as a reference).