SILICA POWDER, RESIN COMPOSITION, AND DISPERSION

Provided is silica powder that, when used as a resin filler such as a semiconductor sealant, allows for obtaining a resin composition having excellent gap permeability and low viscosity. The silica powder is such that (1) a cumulative 50% mass diameter D50 of a mass-based particle size distribution...

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Bibliographische Detailangaben
Hauptverfasser: NUMATA, Masayuki, AOKI, Hiroo, SAIKI, Keiji, UENO, Teppei
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Provided is silica powder that, when used as a resin filler such as a semiconductor sealant, allows for obtaining a resin composition having excellent gap permeability and low viscosity. The silica powder is such that (1) a cumulative 50% mass diameter D50 of a mass-based particle size distribution obtained by a centrifugal sedimentation method is 300 nm to 500 nm (preferably, 330 nm to 400 nm), (2) a loose bulk density is 250 kg/m3 to 400 kg/m3 (preferably, 270 kg/m3 to 350 kg/m3), and (3) {(D90−D50)/D50}×100 is 30% to 45%. In a silica production method in which a silicon compound is burned, silica powder can be produced by installing a burner having a concentric multiple pipe structure of three or more pipes in a reactor which has a cooling jacket portion provided around the burner, and adjusting flame combustion conditions and cooling conditions.