METHOD AND APPARATUS FOR CLEANING SUBSTRATES

The present invention provides a method for cleaning substrates comprising the steps of: placing a substrate on a substrate holder; implementing a bubble less or bubble-free pre-wetting process for the substrate; and implementing an ultra/mega sonic cleaning process for cleaning the substrate.

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Bibliographische Detailangaben
Hauptverfasser: Zhang, Xiaoyan, Wang, Hui, Chen, Fuping, Wang, Xi, Chen, Fufa
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention provides a method for cleaning substrates comprising the steps of: placing a substrate on a substrate holder; implementing a bubble less or bubble-free pre-wetting process for the substrate; and implementing an ultra/mega sonic cleaning process for cleaning the substrate.