MASK ASSEMBLY

A mask assembly includes a mask and a blocking stick. The mask includes a pattern region formed therein with openings and extends in a first direction. The blocking stick is disposed under the mask and overlaps a first side portion of the mask. The mask further includes dummy opening regions and ope...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KIM, JONGBUM, PARK, JONGSUNG, KANG, YEONJU, LEE, SEUNGJIN, JUNG, EUNJOUNG, KIM, SANGHOON, LEE, SANGSHIN
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A mask assembly includes a mask and a blocking stick. The mask includes a pattern region formed therein with openings and extends in a first direction. The blocking stick is disposed under the mask and overlaps a first side portion of the mask. The mask further includes dummy opening regions and opening regions. The dummy opening regions are arranged in the first direction in the first side portion of the mask, and are formed therein with openings. The opening regions are arranged in the first direction in a second side portion which is opposite to the first side portion of the mask and correspond to the dummy opening regions, respectively. The number of the openings per a unit area in each of the dummy opening region and the opening region is smaller than the number of the openings per a unit area in the pattern region.