SUBSTRATE STATE DETECTION FOR PLASMA PROCESSING TOOLS

SUBSTRATE STATE DETECTION FOR PLASMA PROCESSING TOOLS

A substrate processing tool capable of detecting a gap and/or shifting of a substrate clamped to a clamping surface in a processing chamber based on observed behavior of RF power delivered to the processing chamber during processing. The behavior of the RF power is observed by comparing a voltage-cu...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MCDANIEL, Thomas, BAKER, Noah Elliot
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Beschreibung
Zusammenfassung:A substrate processing tool capable of detecting a gap and/or shifting of a substrate clamped to a clamping surface in a processing chamber based on observed behavior of RF power delivered to the processing chamber during processing. The behavior of the RF power is observed by comparing a voltage-current phase angle difference and/or impedance magnitude change between a real RF power component and a reactive RF power component of the RF power delivered to the processing chamber.