PLATING HANGER FOR OBTAINING HOMOGENEOUS PLATING

PLATING HANGER FOR OBTAINING HOMOGENEOUS PLATING

A plating hanger is provided. The plating hanger provides a homogeneous plating by equalizing high current and low current zones by changing distances of part connections holding materials to be coated to an anode. The plating hanger includes at least one hanger frame, and a hanger body having part...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: AKKAYA, Ali, GELMEZ, Buket, USANMAZ, Yener, AGAOGLU, Hasan, OZTAS KAPLAN, Zahide
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Beschreibung
Zusammenfassung:A plating hanger is provided. The plating hanger provides a homogeneous plating by equalizing high current and low current zones by changing distances of part connections holding materials to be coated to an anode. The plating hanger includes at least one hanger frame, and a hanger body having part connections holding the materials to be coated on the plating hanger