METHOD OF FILTERING LIQUIDS OR GASES FOR ELECTRONICS PRODUCTION

Methods of filtering a feed comprising a liquid or a gas for or during the production of electronics, nanosystems or ultrapure water include filtering said feed using at least one filter assembly, wherein said at least one filter assembly includes at least one isoporous block copolymer filtration me...

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Bibliographische Detailangaben
Hauptverfasser:	Robbins, Spencer, Dorin, Rachel M
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTROGRAPHY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING HOLOGRAPHY MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS POLISHING SEPARATION TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:	Methods of filtering a feed comprising a liquid or a gas for or during the production of electronics, nanosystems or ultrapure water include filtering said feed using at least one filter assembly, wherein said at least one filter assembly includes at least one isoporous block copolymer filtration membrane.