BACKSIDE METALIZATION WITH THROUGH-WAFER-VIA PROCESSING TO ALLOW USE OF HIGH Q BONDWIRE INDUCTANCES

A method of forming a flip-chip integrated circuit die that includes a front side including active circuitry formed therein and a plurality of bond pads in electrical communication with the active circuitry, at least two through-wafer vias in electrical communication with the active circuitry and extending at least partially though the die and having portions at a rear side of the die, and a bond wire external to the die and electrically coupling the portions of the at least two through-wafer vias to one another at the rear side of the die.