SUBSTRATE PROCESSING APPARATUS, STAGE, AND TEMPERATURE CONTROL METHOD

SUBSTRATE PROCESSING APPARATUS, STAGE, AND TEMPERATURE CONTROL METHOD

A substrate processing apparatus includes a stage on which a substrate is placed, wherein the stage includes a first plate, a first temperature adjustment mechanism configured to control a temperature of the first plate, a second plate provided below the first plate, a second temperature adjustment...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: SAITO, Hideto
Format: Patent
Sprache:eng
Schlagworte:
BLASTING
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OFGENERAL APPLICATION
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERATION
HEAT EXCHANGE IN GENERAL
HEATING
LIGHTING
MECHANICAL ENGINEERING
WEAPONS
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Beschreibung
Zusammenfassung:A substrate processing apparatus includes a stage on which a substrate is placed, wherein the stage includes a first plate, a first temperature adjustment mechanism configured to control a temperature of the first plate, a second plate provided below the first plate, a second temperature adjustment mechanism configured to control a temperature of the second plate, and a fastening member configured to fasten the first plate and the second plate.