METAL MASK MATERIAL, METHOD FOR MANUFACTURING SAME, AND METAL MASK

A metal mask material for OLED use reduced in amount warpage due to etching, a method for manufacturing the same, and a metal mask are provided. The metal mask material and metal mask of the present invention contain, by mass %, Ni: 35.0 to 37.0% and Co: 0.00 to 0.50%, have a balance of Fe and impur...

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Bibliographische Detailangaben
Hauptverfasser:	FUJIMOTO, Naoki, KIMURA, Keita, YONEMURA, Mitsuharu, UNNO, Hiroto
Format:	Patent
Sprache:	eng
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY FERROUS OR NON-FERROUS ALLOYS GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUSMETALS OR ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAKING METAL MALLEABLE BY DECARBURISATION, TEMPERING OR OTHERTREATMENTS METALLURGY METALLURGY OF IRON MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	A metal mask material for OLED use reduced in amount warpage due to etching, a method for manufacturing the same, and a metal mask are provided. The metal mask material and metal mask of the present invention contain, by mass %, Ni: 35.0 to 37.0% and Co: 0.00 to 0.50%, have a balance of Fe and impurities, have thicknesses of 5.00 μm or more and 50.00 μm or less, and have amounts of warpage defined as maximum values in amounts of rise of four corners of a square shaped sample of the metal mask material of 100 mm sides when etching the sample from one surface until the thickness of the sample becomes ⅖ and placing the etched sample on a surface plate of 5.0 mm or less.