SEMICONDUCTOR DEVICES INCLUDING FERROELECTRIC MATERIALS

A method of forming a ferroelectric memory cell. The method comprises forming an electrode material exhibiting a desired dominant crystallographic orientation. A hafnium-based material is formed over the electrode material and the hafnium-based material is crystallized to induce formation of a ferro...

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Bibliographische Detailangaben
Hauptverfasser: Cook, Beth R, Tao, Qian, Ramaswamy, Durai Vishak Nirmal, Rocklein, Matthew N
Format: Patent
Sprache:eng
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Zusammenfassung:A method of forming a ferroelectric memory cell. The method comprises forming an electrode material exhibiting a desired dominant crystallographic orientation. A hafnium-based material is formed over the electrode material and the hafnium-based material is crystallized to induce formation of a ferroelectric material having a desired crystallographic orientation. Additional methods are also described, as are semiconductor device structures including the ferroelectric material.