DIRECT TO SUBSTRATE COATING VIA IN SITU POLYMERIZATION

Disclosed is a process that utilizes a modified Atom Transfer Radical Polymerization (ATRP) process to form a water-resistant coating in situ on a substrate. The process uses solvent soluble monomers, initiator and ligand to form a solvent insoluble water-resistant polymer coating that is deposited...

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Bibliographische Detailangaben
Hauptverfasser: Zimmerman, John L, Kuhns, Eric C, Miller, Lisa K, Donaldson, Gregory T, Kozak, William G, Smith, II, Thomas S, McGee, John D
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Disclosed is a process that utilizes a modified Atom Transfer Radical Polymerization (ATRP) process to form a water-resistant coating in situ on a substrate. The process uses solvent soluble monomers, initiator and ligand to form a solvent insoluble water-resistant polymer coating that is deposited directly onto a metal trace on the substrate. The process is especially useful for providing a water-resistant coating to the circuits on a printed circuit board, wearable electronics, and biological sensors. The process can be run in an aqueous solvent in the open atmosphere and does not require a vacuum, heating steps or masking. The coating is deposited only on the metal trace and closely adjacent areas of the substrate.