PHOTOMASK CLEANING

Generally, examples described herein relate to methods and apparatus for photomask processing. In an example, a photomask is obtained that is protected by a pellicle during a photolithography process. The photomask is cleaned by performing an etch process on the photomask using an etchant that is se...

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Bibliographische Detailangaben
1. Verfasser:	CULLINS, Jerry
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Generally, examples described herein relate to methods and apparatus for photomask processing. In an example, a photomask is obtained that is protected by a pellicle during a photolithography process. The photomask is cleaned by performing an etch process on the photomask using an etchant that is selective to etch a first material of the pellicle at a greater rate than each material of the photomask. In some examples, the pellicle includes a rigid material through which radiation is transmitted during the photolithography process.