MEMORY DEVICE AND METHOD OF MANUFACTURING MEMORY DEVICE
According to one embodiment, a memory device includes: a first layer stack provided in a first area of a substrate; second and third layer stacks provided in a second area of the substrate; a memory cell provided in the first layer stack; a first mark portion provided in the second layer stack; a se...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | According to one embodiment, a memory device includes: a first layer stack provided in a first area of a substrate; second and third layer stacks provided in a second area of the substrate; a memory cell provided in the first layer stack; a first mark portion provided in the second layer stack; a second mark portion provided in the third layer stack; and a first portion provided between the second layer stack and the third layer stack. |
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