MEMORY DEVICE AND METHOD OF MANUFACTURING MEMORY DEVICE

According to one embodiment, a memory device includes: a first layer stack provided in a first area of a substrate; second and third layer stacks provided in a second area of the substrate; a memory cell provided in the first layer stack; a first mark portion provided in the second layer stack; a se...

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Bibliographische Detailangaben
1. Verfasser: KONOMI, Kenji
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:According to one embodiment, a memory device includes: a first layer stack provided in a first area of a substrate; second and third layer stacks provided in a second area of the substrate; a memory cell provided in the first layer stack; a first mark portion provided in the second layer stack; a second mark portion provided in the third layer stack; and a first portion provided between the second layer stack and the third layer stack.