SYSTEMS FOR WORKPIECE PROCESSING WITH PLASMA

Systems, methods, and apparatuses for workpiece processing with plasma, including thermal isolation of a workpiece holder assembly, are described. An apparatus includes a chamber that at least partially defines a processing space for generating plasma. The apparatus includes a base assembly that at least partially defines a lower end of the chamber and has an inner perimeter that defines an opening in the base assembly. The apparatus further includes a workpiece holder assembly positioned, at least in part, within the opening. The workpiece holder assembly includes heating element(s) and a body with an upper surface configured to receive a workpiece. A gap is defined between the inner perimeter of the base assembly and an outer perimeter of the body. The gap is configured to thermally isolate the base assembly from the body.