BURIED DAMAGE LAYERS FOR ELECTRICAL ISOLATION

Structures including electrical isolation and methods of forming a structure including electrical isolation. A first polycrystalline layer is located in a substrate, and a second polycrystalline layer is positioned between the first polycrystalline layer and a top surface of the substrate. The subst...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Adusumilli, Siva P, Stamper, Anthony K, Ellis-Monaghan, John J, Babu, Bojidha, Abou-Khalil, Michel J
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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