TRANSPARENT CONDUCTIVE FILM

Described herein is a transparent conductive film including(a) a first laminate includingat least two layers containing TiO2, ZrO2 or HfO2, anda layer containing an organic compound in between the two layers containing TiO2, ZrO2 or HfO2,(b) a metal layer, and(c) a second laminate includingat least...

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Bibliographische Detailangaben
Hauptverfasser:	Jung, Jin Won, Reinke, Michael, Flores, Jean-Charles, Cho, Boram, Sung, Myung Mo
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Described herein is a transparent conductive film including(a) a first laminate includingat least two layers containing TiO2, ZrO2 or HfO2, anda layer containing an organic compound in between the two layers containing TiO2, ZrO2 or HfO2,(b) a metal layer, and(c) a second laminate includingat least two layers containing ZnO,a layer containing an organic compound between the two layers containing ZnO, anda metallic dopant other than zinc.