VAPOR DEPOSITION MASK, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK, AND METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT

A vapor deposition mask (100) including: a magnetic metal member (20) including at least one first opening (25); and a layered member (30) that is arranged on the magnetic metal member (20) so as to cover the at least one first opening (25) and has a plurality of second openings (13) located in the at least one first opening (25), wherein: the layered member (30) includes a first layer (m1) and a second layer (m2) that is arranged between the first layer (m1) and the magnetic metal member (20); and in the at least one first opening (25), at a first temperature that is greater than or equal to room temperature, an elastic modulus E1 of the first layer, a thickness a1 of the first layer, an internal stress σ1 of the first layer, an elastic modulus E2 of the second layer, a thickness a2 of the second layer and an internal stress σ2 of the second layer (where σ1 and σ2 are positive for tensile stress) satisfy Expressions (1) and (2) below:σ1/E1−σ2/E2