SYSTEM AND METHOD FOR CHARACTERIZATION OF PATTERNS MARKED ON A FABRIC

A system and method for characterization of patterns marked on a fabric. The system includes a light source generating a light beam to impinge on a fabric; an optical arrangement including a parabolic mirror with a hole and an optical device, directing said light beam towards the fabric; a wavelengt...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	TORRES PEIRÓ, Salvador, PÉREZ VIZCAÍNO, Jorge, PÉREZ MILLÁN, Pere, MIRA PAYA, Ricardo
Format:	Patent
Sprache:	eng
Schlagworte:	FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES LAUNDERING MEASURING PHYSICS TESTING TEXTILES TREATING TEXTILE MATERIALS BY LIQUIDS, GASES OR VAPOURS TREATMENT OF TEXTILES OR THE LIKE
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Beschreibung
Zusammenfassung:	A system and method for characterization of patterns marked on a fabric. The system includes a light source generating a light beam to impinge on a fabric; an optical arrangement including a parabolic mirror with a hole and an optical device, directing said light beam towards the fabric; a wavelength division unit; a light detection unit; and a computing device. The optical device changes and orients the direction of the light beam towards the fabric providing a scan of an area of the fabric, line-by-line, and redirects scattered light towards the light detection unit. The wavelength division unit separates the scattered light into spectral bands or colors and the computing device characterizes a pattern marked on the fabric by executing an algorithm that analyzes electrical voltage signals and that computes a quality measure of said marked pattern.