Method for Manufacturing a Multilayer Radiation Window and a Multilayer Radiation Window
The invention relates to a method for manufacturing a multilayer radiation window for an X-ray measurement apparatus. The method comprises: producing a gas diffusion stop layer made of silicon nitride on a polished surface of a carrier; producing at least one combined layer on an opposite side of sa...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The invention relates to a method for manufacturing a multilayer radiation window for an X-ray measurement apparatus. The method comprises: producing a gas diffusion stop layer made of silicon nitride on a polished surface of a carrier; producing at least one combined layer on an opposite side of said gas diffusion stop layer than said carrier; attaching the combined structure comprising said carrier, said gas diffusion stop layer, said at least one combined layer to a region around an opening in a support structure with the at least one combined layer facing said support structure; and etching away said carrier. The at least one combined layer comprises: a light attenuation layer made of aluminium, and a strengthening layer. The invention relates also a radiation window manufactured with the method. |
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