SEMICONDUCTOR DEVICE

A semiconductor device is provided. The semiconductor device includes a substrate, a first III-V compound layer disposed on the substrate, a second III-V compound layer disposed on the first III-V compound layer, a p-type doped III-V compound layer disposed on the second III-V compound layer, a gate...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIN, Hsin-Chih, LIN, Shin-Cheng, LIN, Yung-Hao
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor device is provided. The semiconductor device includes a substrate, a first III-V compound layer disposed on the substrate, a second III-V compound layer disposed on the first III-V compound layer, a p-type doped III-V compound layer disposed on the second III-V compound layer, a gate disposed over the p-type doped III-V compound layer, a source and a drain disposed on opposite sides of the gate, and a dielectric layer disposed between the p-type doped III-V compound layer and the gate. A method for forming the above semiconductor device is also provided.