RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND ACID DIFFUSION-CONTROLLING AGENT

A resist composition is provided that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid. The resist composition includes a base material component whose solubility in a developing solution is changed by action of an acid, and a compound rep...

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Bibliographische Detailangaben
Hauptverfasser:	SHIOSAKI, Masahiro, TODOROKI, Seiji, YAMAZAKI, Hiroto, MICHIBAYASHI, Nobuhiro
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A resist composition is provided that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid. The resist composition includes a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (d0) in which Rd01 represents a monovalent organic group, Rd02 represents a single bond or a divalent linking group, m represents an integer of 1 or greater, and Mm+ represents an m-valent organic cation