SEMICONDUCTOR WAFER MASS METROLOGY APPARATUS AND SEMICONDUCTOR WAFER MASS METROLOGY METHOD

SEMICONDUCTOR WAFER MASS METROLOGY APPARATUS AND SEMICONDUCTOR WAFER MASS METROLOGY METHOD

A semiconductor wafer mass metrology apparatus comprising: a measurement chamber for measuring the weight and/or the mass of a semiconductor wafer; a first temperature changing part for changing a temperature of the semiconductor wafer before the semiconductor wafer is transported into the measureme...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: TONNIS, Eric, ELLIOTT, Gregor
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Beschreibung
Zusammenfassung:A semiconductor wafer mass metrology apparatus comprising: a measurement chamber for measuring the weight and/or the mass of a semiconductor wafer; a first temperature changing part for changing a temperature of the semiconductor wafer before the semiconductor wafer is transported into the measurement chamber; and a first temperature sensor for sensing a first temperature, wherein the first temperature is: a temperature of the first temperature changing part; or a temperature of the semiconductor wafer when the semiconductor wafer is on the first temperature changing part, or when the semiconductor wafer leaves the first temperature changing part.