FOCUS-RING CONVEYING MEMBER AND PLASMA PROCESSING DEVICE INCLUDING FOCUS-RING CONVEYING MEMBER

FOCUS-RING CONVEYING MEMBER AND PLASMA PROCESSING DEVICE INCLUDING FOCUS-RING CONVEYING MEMBER

A focus-ring conveying member includes a substrate; and a first electrode for electrostatic attraction arranged in the substrate. The plasma processing device according to the present disclosure includes the above-mentioned focus-ring conveying member; a pedestal including a placement surface on whi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: MUNEISHI, Takeshi
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CHAMBERS PROVIDED WITH MANIPULATION DEVICES
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERATION
HAND TOOLS
MANIPULATORS
PERFORMING OPERATIONS
PORTABLE POWER-DRIVEN TOOLS
TRANSPORTING
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Beschreibung
Zusammenfassung:A focus-ring conveying member includes a substrate; and a first electrode for electrostatic attraction arranged in the substrate. The plasma processing device according to the present disclosure includes the above-mentioned focus-ring conveying member; a pedestal including a placement surface on which an object to be treated is placed; a focus ring that is arranged to surround the placement surface; and a support member that supports the focus ring. The support member includes a second electrode for electrostatic attraction which is arranged in the support member.