APPARATUS AND METHOD FOR DETERMINING REFRACTIVE INDEX, CENTRAL TENSION, OR STRESS PROFILE

Apparatus can comprise a cavity at least partially defined by a first major surface of a reference block and configured to receive a sample. The apparatus can comprise a first polarization-switching light source configured to emit a first polarization-switched light beam toward the cavity and a firs...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Furnas, William John, Sundaram, Balamurugan Meenakshi, Kim, Jin Su
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Apparatus can comprise a cavity at least partially defined by a first major surface of a reference block and configured to receive a sample. The apparatus can comprise a first polarization-switching light source configured to emit a first polarization-switched light beam toward the cavity and a first detector configured to detect a corresponding signal. The apparatus can comprise a second polarization-switching light source configured to emit a second polarization-switched light beam toward the cavity and a second detector configured to detect a corresponding signal. The first reference block can be positioned between the second detector and the second reference block. Methods of determining an estimated stress profile can comprise determining a central tension from a measured retardation profile of the sample. Methods can comprise determining an initial stress profile from a refractive index profile of the sample. Methods can comprise scaling and adjusting stress profiles.