PLASMA GENERATION DEVICE AND PLASMA IRRADIATION METHOD

Atmospheric-pressure plasma generation device 10 of the present invention includes heat sinks 27 and 28. Flow paths are formed in the heat sinks, and cooling gas flows in the flow paths, thereby cooling lower housing 20 in which a reaction chamber is formed. Here, the gas used for cooling is warmed...

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Bibliographische Detailangaben
Hauptverfasser:	JINDO, Takahiro, IKEDO, Toshiyuki
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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Beschreibung
Zusammenfassung:	Atmospheric-pressure plasma generation device 10 of the present invention includes heat sinks 27 and 28. Flow paths are formed in the heat sinks, and cooling gas flows in the flow paths, thereby cooling lower housing 20 in which a reaction chamber is formed. Here, the gas used for cooling is warmed by the heat of the lower housing. The warmed gas is supplied into heated gas supply device 14 and heated by heater 112. The heated gas flows in lower cover 22 and is emitted together with plasma gas from lower cover 22 toward a processing object. Consequently, it is possible to perform cooling of the lower housing heated by electric discharge and perform heating of the processing object, and it is possible to reduce energy required for heating gas.