SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE RECEPTACLE STORAGE METHOD

A substrate processing apparatus configured to process a substrate includes a substrate receptacle placing unit configured to place thereon a substrate receptacle accommodating therein the substrate to be processed; and a storage zone provided adjacent to the substrate receptacle placing unit to store therein the substrate receptacle. The storage zone includes multiple storages which are vertically arranged in multiple levels and configured to place and store thereon the multiple substrate receptacles horizontally. The substrate receptacle is transferred between a first storage of the multiple storages at an uppermost position and a ceiling travelling vehicle configured to be moved above the substrate processing apparatus. A second storage of the multiple storages under the first storage is configured to place and store the substrate receptacle thereon such that a direction of the substrate receptacle on the second storage is different from a direction of the substrate receptacle on the first storage.