PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

A plasma processing method includes: supplying a gas into a processing container; and intermittently supplying microwave powers output from a plurality of microwave introducing modules into the processing container. In the intermittently supplying the microwave powers, the supply of all the microwav...

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Bibliographische Detailangaben
Hauptverfasser: ASHIDA, Mitsutoshi, UEDA, Hirokazu, KAMATA, Eiki, GUNJI, Isao, IKEDA, Taro
Format: Patent
Sprache:eng
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