PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

A plasma processing method includes: supplying a gas into a processing container; and intermittently supplying microwave powers output from a plurality of microwave introducing modules into the processing container. In the intermittently supplying the microwave powers, the supply of all the microwav...

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Bibliographische Detailangaben
Hauptverfasser: ASHIDA, Mitsutoshi, UEDA, Hirokazu, KAMATA, Eiki, GUNJI, Isao, IKEDA, Taro
Format: Patent
Sprache:eng
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Zusammenfassung:A plasma processing method includes: supplying a gas into a processing container; and intermittently supplying microwave powers output from a plurality of microwave introducing modules into the processing container. In the intermittently supplying the microwave powers, the supply of all the microwave powers from the plurality of microwave introducing modules is periodically in an OFF state for a given time.