PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

A plasma processing method includes: supplying a gas into a processing container; and intermittently supplying microwave powers output from a plurality of microwave introducing modules into the processing container. In the intermittently supplying the microwave powers, the supply of all the microwav...

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Hauptverfasser: ASHIDA, Mitsutoshi, UEDA, Hirokazu, KAMATA, Eiki, GUNJI, Isao, IKEDA, Taro
Format: Patent
Sprache:eng
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BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
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creator ASHIDA, Mitsutoshi
UEDA, Hirokazu
KAMATA, Eiki
GUNJI, Isao
IKEDA, Taro
description A plasma processing method includes: supplying a gas into a processing container; and intermittently supplying microwave powers output from a plurality of microwave introducing modules into the processing container. In the intermittently supplying the microwave powers, the supply of all the microwave powers from the plurality of microwave introducing modules is periodically in an OFF state for a given time.
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subjects BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
title PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
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