PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or a...

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Hauptverfasser:	Moors, Johannes Hubertus Josephina, Wieggers, Rob Carlo, Leenders, Martinus Hendrikus Antonius, Duarte Rodrigues Nunes, Rui Miguel, Ma, Yue, Korkmaz, Celal, Westerlaken, Jan Steven Christiaan, Van Drent, William Peter, Zhu, Qiushi, Van De Wiel, Hubertus Johannes, Hummler, Klaus Martin, Brizuela, Fernando, Van Dijck, Hendrikus Alphonsus Ludovicus, Ershov, Alexander Igorevich, Laforge, Andrew David, Rommers, Jeroen Hubert, Jacobs, Johannes Henricus Wilhelmus, Kuznetsov, Alexey Sergeevich, Kempen, Antonius Theodorus Wilhelmus, Gomes, Umesh Prasad, Kim, Alexander Downn, Nedanovska, Elena, Liu, Fei, Jonkers, Peter Gerardus, Fomenkov, Igor Vladimirovich, Yaghoobi, Parham
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.