SEMICONDUCTOR DEVICE

A semiconductor device including: a substrate including a first active region; a first active pattern on the first active region; a gate electrode intersecting the first active pattern and extending in a first direction; a first source/drain pattern on the first active pattern, the first source/drai...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PARK, JUHUN, BAE, DEOKHAN, KIM, SUNGMIN, JUNG, YOONYOUNG
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A semiconductor device including: a substrate including a first active region; a first active pattern on the first active region; a gate electrode intersecting the first active pattern and extending in a first direction; a first source/drain pattern on the first active pattern, the first source/drain pattern adjacent to the gate electrode; a first interlayer insulating layer covering the gate electrode and the first source/drain pattern; and an active contact penetrating the first interlayer insulating layer to be electrically connected to the first source/drain pattern, wherein the active contact extends in the first direction, wherein a top surface of the active contact includes: a first protrusion; a second protrusion; and a first depression between the first and second protrusions.