PROCESSING INFORMATION MANAGEMENT SYSTEM AND METHOD FOR MANAGING PROCESSING INFORMATION

According to one embodiment, a processing information management system includes: an abnormality analyzer configured to generate abnormality occurrence data of a target wafer based on processing location information, the processing location information collected based on a first sensor outputting a...

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Bibliographische Detailangaben
Hauptverfasser:	SAEKI, Hidekazu, KAWAMURA, Kenta
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	According to one embodiment, a processing information management system includes: an abnormality analyzer configured to generate abnormality occurrence data of a target wafer based on processing location information, the processing location information collected based on a first sensor outputting a first sensor signal according to a detected processing state, the first sensor provided in a wafer processing apparatus; and an integration system configured to integrate the abnormality occurrence data into wafer map data corresponding to the target wafer.