SEMICONDUCTOR DEVICE
A semiconductor device includes a first semiconductor layer, a second semiconductor layer provided on a portion of the first semiconductor layer, a third semiconductor layer provided on a portion of the second semiconductor layer and separated from the first semiconductor layer, a fourth semiconduct...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A semiconductor device includes a first semiconductor layer, a second semiconductor layer provided on a portion of the first semiconductor layer, a third semiconductor layer provided on a portion of the second semiconductor layer and separated from the first semiconductor layer, a fourth semiconductor layer provided on an other portion of the first semiconductor layer, a first insulating film provided on a portion between the third semiconductor layer and the fourth semiconductor layer and on a portion of the fourth semiconductor layer at the second semiconductor layer side, a second insulating film contacting the first insulating film, a third insulating film provided above the second insulating film, and an electrode provided on the first insulating film, on the second insulating film, and on the third insulating film. The second insulating film is provided on the fourth semiconductor layer, and is thicker than the first insulating film. |
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