LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder c...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Soethoudt, Abraham Alexander, Stevens, Lucas Henricus Johannes, Harberts, Dirk Willem, Fernandez Diaz, Laura Maria, Poiesz, Thomas, Welters, Wilhelmus Jacobus Johannes, Scholten, Bert Dirk, Pijnenburg, Johannes Adrianus Cornelis M, Van De Winkel, Jimmy Matheus Wilhelmus
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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