LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder c...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Soethoudt, Abraham Alexander, Stevens, Lucas Henricus Johannes, Harberts, Dirk Willem, Fernandez Diaz, Laura Maria, Poiesz, Thomas, Welters, Wilhelmus Jacobus Johannes, Scholten, Bert Dirk, Pijnenburg, Johannes Adrianus Cornelis M, Van De Winkel, Jimmy Matheus Wilhelmus
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.