METHOD FOR IMPROVING FLATNESS OF SEMICONDUCTOR THIN FILM

The present invention provides a method for improving semiconductor thin film flatness, the method comprises providing a wafer; performing a vapor phase deposition to from an epitaxial layer on the wafer; wherein a gas suppresses epitaxial layer growth is added during the vapor phase deposition in o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Dong, Chenhua, Lin, Chihhsin, Cao, Gongbai
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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