LAMINAR FLOW RESTRICTOR

Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor i...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	McIntyre, Zachariah Ezekiel, Wright, Tyler James, Penley, Sean Joseph
Format:	Patent
Sprache:	eng
Schlagworte:	ACTUATING-FLOATS BLASTING COCKS CONTROLLING DEVICES FOR VENTING OR AERATING ENGINEERING ELEMENTS AND UNITS FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOWOF GASES OR LIQUIDS FLUID-PRESSURE ACTUATORS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING HYDRAULICS OR PNEUMATICS IN GENERAL LIGHTING MEASURING MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL MECHANICAL ENGINEERING METERING BY VOLUME PHYSICS REGULATING SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TAPS TESTING THERMAL INSULATION IN GENERAL VALVES WEAPONS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.