Drop Pattern Correction for Nano-Fabrication

A preliminary drop pattern is provided that defines a predetermined location on a substrate for a center of mass of each drop of a plurality of drops. The preliminary drop pattern is adjusted to generate an adjusted drop pattern by radially shifting each drop of a subset of drops of the plurality of drops from the predetermined location by a radial offset. The plurality of drops is dispensed according to the adjusted drop pattern. A template or a superstrate is contacted with the dispensed drops, after which the center of mass of each drop of the subset of drops is radially displaced to a displaced location on the substrate prior to the plurality of drops forming a continuous layer. The radial offset is selected such that the displaced location is within 50 μm of the predetermined location of the corresponding drop of the preliminary drop pattern.