SEMICONDUCTOR DEVICE
Disclosed is a semiconductor device comprising a logic cell including first and second active regions spaced apart in a first direction on a substrate, first and second active patterns on the first and second active regions and extend in a second direction, first and second source/drain patterns on...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Disclosed is a semiconductor device comprising a logic cell including first and second active regions spaced apart in a first direction on a substrate, first and second active patterns on the first and second active regions and extend in a second direction, first and second source/drain patterns on the first and second active patterns, gate electrodes extending in the first direction to run across the first and second active patterns and arranged in the second direction at a first pitch, first lines in a first interlayer dielectric layer on the gate electrodes and each electrically connected to the first source/drain pattern, the second source/drain pattern, or the gate electrode, and second lines in a second interlayer dielectric layer on the first interlayer dielectric layer and extending parallel to each other in the first direction. |
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