DISPERSION LIQUID OF SILICA PARTICLES AND PRODUCTION METHOD THEREFOR
Provided is a dispersion liquid of silica particles, comprising silica particles having an average particle diameter of 5 to 300 nm determined from an electron micrograph and a density of 1.20 g/cm3 or more determined from a specific surface area determined by a BET method using nitrogen adsorption,...
Gespeichert in:
| Hauptverfasser: | , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KUMAZAWA, Mitsuaki ARAKANE, Hirotada MURAGUCHI, Ryo HIRAI, Toshiharu EGAMI, Miki |
| description | Provided is a dispersion liquid of silica particles, comprising silica particles having an average particle diameter of 5 to 300 nm determined from an electron micrograph and a density of 1.20 g/cm3 or more determined from a specific surface area determined by a BET method using nitrogen adsorption, wherein the dispersion liquid has a pH of less than 8, a silica concentration of 12 to 40% by mass, and a viscosity in terms of a silica concentration of 20% by mass of 40 mPa·s or less. When this silica particle is used as an abrasive, it is possible to realize a sufficient polishing speed and a smooth polished surface on which occurrence of scratches is suppressed. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2020392374A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2020392374A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2020392374A13</originalsourceid><addsrcrecordid>eNrjZHBx8QwOcA0K9vT3U_DxDAz1dFHwd1MI9vTxdHZUCHAMCvF09nENVnD0c1EICPJ3CXUOAan0dQ3x8HdRCPFwDXJ18w_iYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBkYGxpZGxuYmjobGxKkCABanLNI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>DISPERSION LIQUID OF SILICA PARTICLES AND PRODUCTION METHOD THEREFOR</title><source>esp@cenet</source><creator>KUMAZAWA, Mitsuaki ; ARAKANE, Hirotada ; MURAGUCHI, Ryo ; HIRAI, Toshiharu ; EGAMI, Miki</creator><creatorcontrib>KUMAZAWA, Mitsuaki ; ARAKANE, Hirotada ; MURAGUCHI, Ryo ; HIRAI, Toshiharu ; EGAMI, Miki</creatorcontrib><description>Provided is a dispersion liquid of silica particles, comprising silica particles having an average particle diameter of 5 to 300 nm determined from an electron micrograph and a density of 1.20 g/cm3 or more determined from a specific surface area determined by a BET method using nitrogen adsorption, wherein the dispersion liquid has a pH of less than 8, a silica concentration of 12 to 40% by mass, and a viscosity in terms of a silica concentration of 20% by mass of 40 mPa·s or less. When this silica particle is used as an abrasive, it is possible to realize a sufficient polishing speed and a smooth polished surface on which occurrence of scratches is suppressed.</description><language>eng</language><subject>ADHESIVES ; CHEMISTRY ; COMPOUNDS THEREOF ; DYES ; INORGANIC CHEMISTRY ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; NON-METALLIC ELEMENTS ; PAINTS ; POLISHES ; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH ; SKI WAXES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201217&DB=EPODOC&CC=US&NR=2020392374A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25555,76308</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201217&DB=EPODOC&CC=US&NR=2020392374A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KUMAZAWA, Mitsuaki</creatorcontrib><creatorcontrib>ARAKANE, Hirotada</creatorcontrib><creatorcontrib>MURAGUCHI, Ryo</creatorcontrib><creatorcontrib>HIRAI, Toshiharu</creatorcontrib><creatorcontrib>EGAMI, Miki</creatorcontrib><title>DISPERSION LIQUID OF SILICA PARTICLES AND PRODUCTION METHOD THEREFOR</title><description>Provided is a dispersion liquid of silica particles, comprising silica particles having an average particle diameter of 5 to 300 nm determined from an electron micrograph and a density of 1.20 g/cm3 or more determined from a specific surface area determined by a BET method using nitrogen adsorption, wherein the dispersion liquid has a pH of less than 8, a silica concentration of 12 to 40% by mass, and a viscosity in terms of a silica concentration of 20% by mass of 40 mPa·s or less. When this silica particle is used as an abrasive, it is possible to realize a sufficient polishing speed and a smooth polished surface on which occurrence of scratches is suppressed.</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>DYES</subject><subject>INORGANIC CHEMISTRY</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>NON-METALLIC ELEMENTS</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</subject><subject>SKI WAXES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBx8QwOcA0K9vT3U_DxDAz1dFHwd1MI9vTxdHZUCHAMCvF09nENVnD0c1EICPJ3CXUOAan0dQ3x8HdRCPFwDXJ18w_iYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBkYGxpZGxuYmjobGxKkCABanLNI</recordid><startdate>20201217</startdate><enddate>20201217</enddate><creator>KUMAZAWA, Mitsuaki</creator><creator>ARAKANE, Hirotada</creator><creator>MURAGUCHI, Ryo</creator><creator>HIRAI, Toshiharu</creator><creator>EGAMI, Miki</creator><scope>EVB</scope></search><sort><creationdate>20201217</creationdate><title>DISPERSION LIQUID OF SILICA PARTICLES AND PRODUCTION METHOD THEREFOR</title><author>KUMAZAWA, Mitsuaki ; ARAKANE, Hirotada ; MURAGUCHI, Ryo ; HIRAI, Toshiharu ; EGAMI, Miki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2020392374A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>DYES</topic><topic>INORGANIC CHEMISTRY</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>NON-METALLIC ELEMENTS</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</topic><topic>SKI WAXES</topic><toplevel>online_resources</toplevel><creatorcontrib>KUMAZAWA, Mitsuaki</creatorcontrib><creatorcontrib>ARAKANE, Hirotada</creatorcontrib><creatorcontrib>MURAGUCHI, Ryo</creatorcontrib><creatorcontrib>HIRAI, Toshiharu</creatorcontrib><creatorcontrib>EGAMI, Miki</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KUMAZAWA, Mitsuaki</au><au>ARAKANE, Hirotada</au><au>MURAGUCHI, Ryo</au><au>HIRAI, Toshiharu</au><au>EGAMI, Miki</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DISPERSION LIQUID OF SILICA PARTICLES AND PRODUCTION METHOD THEREFOR</title><date>2020-12-17</date><risdate>2020</risdate><abstract>Provided is a dispersion liquid of silica particles, comprising silica particles having an average particle diameter of 5 to 300 nm determined from an electron micrograph and a density of 1.20 g/cm3 or more determined from a specific surface area determined by a BET method using nitrogen adsorption, wherein the dispersion liquid has a pH of less than 8, a silica concentration of 12 to 40% by mass, and a viscosity in terms of a silica concentration of 20% by mass of 40 mPa·s or less. When this silica particle is used as an abrasive, it is possible to realize a sufficient polishing speed and a smooth polished surface on which occurrence of scratches is suppressed.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2020392374A1 |
| source | esp@cenet |
| subjects | ADHESIVES CHEMISTRY COMPOUNDS THEREOF DYES INORGANIC CHEMISTRY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-METALLIC ELEMENTS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES |
| title | DISPERSION LIQUID OF SILICA PARTICLES AND PRODUCTION METHOD THEREFOR |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T03%3A15%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KUMAZAWA,%20Mitsuaki&rft.date=2020-12-17&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2020392374A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |