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A technique comprising: providing a workpiece including a stack of layers defining an array of transistors including organic semiconductor channels, wherein the stack of layers comprises an upper conductor pattern (8) defining an array of upper conductor elements, each in contact with a respective l...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Harrison, Charlotte, Norval, Shane
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A technique comprising: providing a workpiece including a stack of layers defining an array of transistors including organic semiconductor channels, wherein the stack of layers comprises an upper conductor pattern (8) defining an array of upper conductor elements, each in contact with a respective lower conductor element (6) of a lower conductor pattern in via-hole regions (10); the method comprising: processing the workpiece by forming over the upper conductor pattern a plugging layer that raises the upper surface level of the workpiece in at least the via-hole regions whilst leaving at least a portion of each upper conductor element exposed; and providing an optical medium (36) over the upper conductor pattern without first forming an inorganic moisture barrier layer on the upper surface of the workpiece.