WAFER PLACEMENT ERROR DETECTION BASED ON MEASURING A CURRENT THROUGH AN ELECTROSTATIC CHUCK AND SOLUTION FOR INTERVENTION

Methods and systems of detection of wafer placement error in a semiconductor processing chamber are disclosed. Methods and systems of interdiction are also disclosed to prevent hardware and wafer damage during semiconductor fabrication if and when a wafer placement error is detected. The method-is b...

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Bibliographische Detailangaben
Hauptverfasser: MUNGEKAR, Hemant, BALASUBRAMANIAN, Ganesh
Format: Patent
Sprache:eng
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