FILM FORMING COMPOSITION

[Problem] To provide a film forming composition curable at low temperature and a film forming method using the same. [Means for Solution] A film forming composition comprising a polysilazane, an organic solvent and aspecific additive, and a film forming method comprising applying it on a substrate a...

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Bibliographische Detailangaben
Hauptverfasser: NOJIMA, Yoshio, SATAKE, Noboru, NOYA, Go, OZAKI, Yuki, KUBO, Masahiko, OKAMURA, Toshiya
Format: Patent
Sprache:eng
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Zusammenfassung:[Problem] To provide a film forming composition curable at low temperature and a film forming method using the same. [Means for Solution] A film forming composition comprising a polysilazane, an organic solvent and aspecific additive, and a film forming method comprising applying it on a substrate and curing. The specific additive is selected from the group consisting of (A) guanidines substituted by a hydrocarbylgroup, (B) crown ether amines containing oxygen and nitrogen as a member thereof, (C) cycloalkanes having an amino-substituted polycyclic structure, (D) oximes substituted by a hydrocarbyl group, and (E) imidazolines.