IMPRINT METHOD, IMPRINT APPARATUS, MANUFACTURING METHOD OF MOLD, AND ARTICLE MANUFACTURING METHOD

An imprint method of performing an imprint process for curing an imprint material in a state in which the imprint material on a shot region of a substrate and a pattern portion of a mold are in contact with each other, includes an adjusting step of adjusting, in accordance with shape information ind...

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Bibliographische Detailangaben
1. Verfasser:	Seki, Junichi
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	An imprint method of performing an imprint process for curing an imprint material in a state in which the imprint material on a shot region of a substrate and a pattern portion of a mold are in contact with each other, includes an adjusting step of adjusting, in accordance with shape information indicating a shape of a surface of at least one of the shot region and the pattern portion in a thickness direction of the pattern portion in the state, at least one of a distortion of the shot region in a planar direction orthogonal to the thickness direction and a distortion of the pattern portion in the planar direction.