METHOD OF MANUFACTURING THIN FILM TRANSISTOR, METHOD OF MANUFACTURING DISPLAY APPARATUS AND THIN FILM TRANSISTOR SUBSTRATE

A method of manufacturing a thin film transistor includes: forming an active pattern on a substrate; forming an insulating layer and a gate electrode layer on the active pattern in order; forming a photoresist pattern on the gate electrode layer; forming a preliminary gate electrode by wet etching t...

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Bibliographische Detailangaben
Hauptverfasser: YOON, Kap Soo, KIM, Joongeol, LEE, Woo Geun, CHOI, Seung-Ha, HONG, Jiyun, LEE, Keum Hee
Format: Patent
Sprache:eng
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Zusammenfassung:A method of manufacturing a thin film transistor includes: forming an active pattern on a substrate; forming an insulating layer and a gate electrode layer on the active pattern in order; forming a photoresist pattern on the gate electrode layer; forming a preliminary gate electrode by wet etching the gate electrode layer using the photoresist pattern; forming an insulating pattern by dry etching the insulating layer using the photoresist pattern and the preliminary gate electrode; and forming a gate electrode by wet etching a side surface of the preliminary gate electrode using the photoresist pattern.