Laser Beam Monitoring System

A laser beam monitoring system configured to monitor an attribute of an incident laser beam (24), the laser beam monitoring system comprising a beam separating element (30) and a plurality of sensors (34a-34d), wherein the beam separating element is configured to form a plurality of sub-beams (24a-2...

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Bibliographische Detailangaben
1. Verfasser:	VAN GREEVENBROEK, Hendrikus Robertus Marie
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COLORIMETRY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION PYROMETRY TESTING
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Beschreibung
Zusammenfassung:	A laser beam monitoring system configured to monitor an attribute of an incident laser beam (24), the laser beam monitoring system comprising a beam separating element (30) and a plurality of sensors (34a-34d), wherein the beam separating element is configured to form a plurality of sub-beams (24a-24d) from the incident laser beam (24), a first sub-beam being directed towards a first sensor of the plurality of sensors and a second sub-beam being directed towards a second sensor of the plurality of sensors, wherein relative intensities of the first and second sub-beams are determined by a spatial position at which the incident laser beam is incident upon the beam separating element.