MASK

A mask, including a dummy region and at least one effective evaporation region. The at least one effective evaporation region is provided with several first through holes. The dummy region is provided with several second through holes. The second through hole has a same shape as the first through ho...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	GONG, Jiaoguo, KE, Xianjun, LI, Jianhua, SU, Junhai, RAN, Yinggang, WU, Junxiong
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A mask, including a dummy region and at least one effective evaporation region. The at least one effective evaporation region is provided with several first through holes. The dummy region is provided with several second through holes. The second through hole has a same shape as the first through hole, a dimension of the second through hole is equal to a dimension the first through hole, and spacing between the second through holes is equal to spacing between the first through holes. The second through holes are disposed in the dummy region on the outer side of the effective evaporation region. The second through hole has the same shape, dimension, and spacing as the first through hole.